Home > Archive>Volume 46, Issue 3, 2016 >
PDF HTML XML Export Cite reminder
Ｓｔｒｕｃｔｕｒｅ Ｄｅｓｉｇｎ ｏｆ ＶＯ２ ￣Ｂａｓｅｄ Ｍｕｌｔｉｌａｙｅｒ Ｓｔｒｕｃｔｕｒｅ Ｗｉｔｈ Ｔｕｎａｂｌｅ Ｅｍｉｔｔａｎｃｅ
DOI:
Author:
Affiliation:

Clc Number:

ＴＢ３４

Fund Project:

  • Article
    • |
  • Figures
    • |
  • Metrics
    • |
  • Reference
    • |
  • Related
    • |
  • Cited by
    • |
  • Materials
    • |
  • Comments
    Abstract:

    Ｉｎ ｐｒｅｓｅｎｔ ｓｔｕｄｙꎬ ａ ｍｕｌｔｉｌａｙｅｒ ｓｔｒｕｃｔｕｒｅ ｃｏｍｐｒｉｓｅｄ ｏｆ ＶＯ２ ｌａｙｅｒ ｗａｓ ｄｅｓｉｇｎｅｄ ｔｏ ａｃｈｉｅｖｅ ｔｕｎａｂｌｅ ｅｍｉｔ￣
    ｔａｎｃｅ ｂａｓｅｄ ｏｎ ｔｈｅ ｐｒｉｎｃｉｐｌｅ ｏｆ ａｓｙｍｍｅｔｒｉｃ Ｆａｂｒｙ￣Ｐｅｒｏｔ (ＦＰ) ｃａｖｉｔｙ. Ｉｎｆｌｕｅｎｃｅ ｏｆ ｔｈｉｃｋｎｅｓｓ ｏｆ ｄｉｆｆｅｒｅｎｔ ｌａｙｅｒｓ ｃｏｎｓｔｉｔｕ￣
    ｔｉｎｇ ｔｈｅ ｍｕｌｔｉｌａｙｅｒ ｓｔｒｕｃｔｕｒｅ ｏｎ ｉｔｓ ｅｍｉｔｔａｎｃｅ ｐｒｏｐｅｒｔｙ ａｎｄ ｔｈｅ ａｎｇｌｅ ｄｅｐｅｎｄｅｎｃｅ ｏｆ ｔｈｅ ｅｍｉｔｔａｎｃｅ ｗｅｒｅ ｉｎｖｅｓｔｉｇａｔｅｄ ｕ￣
    ｓｉｎｇ ｔｈｅ ｍｅｔｈｏｄ ｏｆ ｏｐｔｉｃａｌ ｓｉｍｕｌａｔｉｏｎ ｃｏｍｐｕｔａｔｉｏｎ.Ｉｔ ｉｓ ｆｏｕｎｄ ｔｈａｔ ｔｈｅ ｖａｒｉａｔｉｏｎ ｏｆ ｔｈｅ ｅｍｉｔｔａｎｃｅ Δε ｉｎｃｒｅａｓｅｄ ｆｉｒｓｔ ａｎｄ
    ｔｈｅｎ ｄｅｃｒｅａｓｅｄ ｗｉｔｈ ｔｈｅ ｔｈｉｃｋｎｅｓｓ ｏｆ ＶＯ２ ｉｎｃｒｅａｓｉｎｇ ｆｒｏｍ １５ ｎｍ ｔｏ １２０ ｎｍ ａｎｄ ｔｈｅ Δε ｒｅａｃｈｅｄ ａ ｍａｘｉｍｕｍ ａｔ ５０ ｎｍ
    ｏｆ ＶＯ２ ｆｉｌｍ. Ｗｈｉｌｅ ｔｈｅ ｔｈｉｃｋｎｅｓｓ ｏｆ ＨｆＯ２ ｌａｙｅｒ ｉｎｆｌｕｅｎｃｅｄ ｔｈｅ ｐｏｓｉｔｉｏｎ ｏｆ ａｂｓｏｒｐｔｉｏｎ ｂａｎｄ ｏｆ ｔｈｅ ｍｕｌｔｉｌａｙｅｒ ｓｔｒｕｃｔｕｒｅ
    ａｎｄ ｔｈｅ Δε ｒｅｍａｉｎｅｄ ａｒｏｕｎｄ ｔｈｅ ｍａｘｉｍｕｍ ｏｆ ０.６ ａｔ ｔｈｅ ｗｉｄｅ ｒａｎｇｅ ｏｆ ｔｈｉｃｋｎｅｓｓ ｏｆ ＨｆＯ２ ｆｒｏｍ ８００ ｎｍ ｔｏ １ ０００ ｎｍ.
    Ｔｈｅ ｃａｌｃｕｌａｔｉｏｎ ｆｏｒ ｅｍｉｔｔａｎｃｅ ｏｆ ｔｈｅ ｍｕｌｔｉｌａｙｅｒ ｓｔｒｕｃｔｕｒｅ ａｔ ｖａｒｉｅｄ ａｎｇｌｅｓ ｉｎｄｉｃａｔｅｓ ｔｈａｔ ｓｉｇｎｉｆｉｃａｎｔ Δε ｏｆ ａｂｏｖｅ ０.４
    ｃｏｕｌｄ ｂｅ ｒｅｍａｉｎｅｄ ｉｎ ａ ｗｉｄｅ ｒａｎｇｅ ｏｆ ａｎｇｌｅｓ ｆｒｏｍ ０° ｔｏ ７０°.

    Reference
    Related
    Cited by
Get Citation

Copy
Share
Article Metrics
  • Abstract:
  • PDF:
  • HTML:
  • Cited by:
History
  • Received:
  • Revised:
  • Adopted:
  • Online: November 28,2016
  • Published:

You are the visitor

Beijing Public Network Security：11010602060147号 京ICP备06019415号-2

Address：P.O.Box 9200-73, Beijing 100076, P.R.China

Postcode：100076 Fax：010-68383237

ServiceTel：010-68383269 E-mail：703@china.com

Copyright：Aerospace Materials ＆ Technology ® 2024 All Rights Reserved