The TiO2 / TiN films were grown by multiarc plasma deposition on Al substrates. Through controlling
the roughness of the substrate material, the prepared films possessed nonspecular reflection effect in visible band.The films were analyzed and characterized by scanning electron microscopy, infrared radiation measurement instrument and the UV visible spectrum. The results show that visible camouflage films with low infrared emission and good binding force can be grown by multi arc plasma deposition on Al substrate. The results show also that the infrared emission tends to be stabilized at a value of about 0. 2, as the thickness of the oxide layer increased.