Situation and Development Trends of CMP for SiC Monocrystal Slice
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    Abstract:

    The development of CMP technology for SiC single crystal is described.The progress and problems of CMP for SiC single crystal are reviewed in the paper,the theory of CMP for SiC single crystal and the influence of technical parameters are discussed,then the future prospect of CMP is outlined.

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  • Received:
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  • Online: November 28,2016
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