%0 Journal Article %T 化学气相沉积法制备氮化硼界面涂层的研究进展 %T Progress on Boron Nitride Interface Coating Achieved by CVD %A 李琳琳,李爱军,彭雨晴,李照谦,汤哲鹏 %J 宇航材料工艺 %J Aerospace Materials & Technology %@ 1007-2330 %V 46 %N 4 %D 2016 %P - %K 界面相涂层,氮化硼,化学气相沉积,三氯化硼,氨气 %K Interface coating,BN,CVD,BCl3,NH3 %X
阐述了BN 界面的优异性能和CVD 制备工艺的优缺点ꎬ主要介绍了CVD-BN 制备过程中沉积温
度、源气体比例、热处理温度等各因素的影响ꎬ指出CVD 法是制备高品质BN 界面涂层的优选方法ꎮ 优化CVD
工艺ꎬ对其制备原理进行深入研究ꎬ将是BN 界面涂层研究的重点ꎬ获得特定结构、性能稳定、厚度可控的BN 界
面相涂层是CVD 法制备BN 界面相涂层的难点。
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The characteristics of BN and CVD are reviewed. Then the deposition process and the effect of deposi ̄
tion temperatureꎬ source gases compositionꎬ heat treatment during the preparation by CVD are summarized. The stabili ̄
zation of process conditions and the reaction mechanism will be the trend for the development of BN coatings. The meth ̄
od to obtain uniform ꎬ controllable thickness and ordered BN interface coatings will be forced in the future study.
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