%0 Journal Article
%T 化学气相沉积法制备氮化硼界面涂层的研究进展
%T Progress on Boron Nitride Interface Coating Achieved by CVD
%A 李琳琳,李爱军,彭雨晴,李照谦,汤哲鹏
%J 宇航材料工艺
%J Aerospace Materials & Technology
%@ 1007-2330
%V 46
%N 4
%D 2016
%P -
%K 界面相涂层,氮化硼,化学气相沉积,三氯化硼,氨气
%K Interface coating,BN,CVD,BCl3,NH3
%X
阐述了BN 界面的优异性能和CVD 制备工艺的优缺点ꎬ主要介绍了CVD-BN 制备过程中沉积温
度、源气体比例、热处理温度等各因素的影响ꎬ指出CVD 法是制备高品质BN 界面涂层的优选方法ꎮ 优化CVD
工艺ꎬ对其制备原理进行深入研究ꎬ将是BN 界面涂层研究的重点ꎬ获得特定结构、性能稳定、厚度可控的BN 界
面相涂层是CVD 法制备BN 界面相涂层的难点。
%X The characteristics of BN and CVD are reviewed. Then the deposition process and the effect of deposi ̄
tion temperatureꎬ source gases compositionꎬ heat treatment during the preparation by CVD are summarized. The stabili ̄
zation of process conditions and the reaction mechanism will be the trend for the development of BN coatings. The meth ̄
od to obtain uniform ꎬ controllable thickness and ordered BN interface coatings will be forced in the future study.
%R
%U http://www.yhclgy.com/yhclgy/home
%1 JIS Version 3.0.0